FORMATION CONDITIONS AND STRUCTURE OF THIN CHROMIUM FILMS PREPARED BY LOW-TEMPERATURE VAPOR-DEPOSITION

被引：12

作者：

IMURA, T

机构：

来源：

THIN SOLID FILMS | 1982年 / 94卷 / 03期

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D O I：

10.1016/0040-6090(82)90301-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

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页码：249 / 255

页数：7

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