NONLINEAR TEMPERATURE-DEPENDENCE OF THE REFRACTIVE-INDEX OF POLYCRYSTALLINE SILICON FILMS AND THE INFLUENCE OF MICROSTRUCTURAL DISORDER

被引：8

作者：

CHANDRASEKHAR, S ^{[1
]}

VENGURLEKAR, AS ^{[1
]}

ROY, SK ^{[1
]}

KARULKAR, VT ^{[1
]}

机构：

[1] TATA INST FUNDAMENTAL RES, BOMBAY 400005, INDIA

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 63卷 / 06期

关键词：

D O I：

10.1063/1.341110

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2072 / 2076

页数：5

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