ELECTROMIGRATION-STIMULATED MOTION OF A LIQUID ALLOY DEFECT IN ALUMINUM THIN-FILMS

被引：7

作者：

HOWARD, JK ^{[1
]}

机构：

[1] IBM CORP,SYST PROD DIV,HOPEWELL JUNCTION,NY 12533

来源：

JOURNAL OF APPLIED PHYSICS | 1973年 / 44卷 / 05期

关键词：

D O I：

10.1063/1.1662505

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1997 / 2001

页数：5

共 29 条

[11] MECHANISM OF SINGLE-CRYSTAL GROWTH IN INSB USING TEMPERATURE-GRADIENT ZONE MELTING [J].

HAMAKER, RW ;

WHITE, WB .

JOURNAL OF APPLIED PHYSICS, 1968, 39 (03) :1758-&

[12]

Hanson M., 1958, CONSTITUTION BINARY

[13] MOTION OF INCLUSION INDUCED BY A DIRECT CURRENT AND A TEMPERATURE GRADIENT [J].

HO, PS .

JOURNAL OF APPLIED PHYSICS, 1970, 41 (01) :64-&

[14] OBSERVATION OF VOID FORMATION INDUCED BY ELECTROMIGRATION IN METALLIC FILMS [J].

HO, PS ;

GLOWINSKI, LD .

ZEITSCHRIFT FUR NATURFORSCHUNG PART A-ASTROPHYSIK PHYSIK UND PHYSIKALISCHE CHEMIE, 1971, A 26 (01) :32-+

[15]

HOWARD J, UNPUBLISHED

[16] HILLOCKS AS STRUCTURAL MARKERS FOR ELECTROMIGRATION RATE MEASUREMENTS IN THIN FILMS [J].

HOWARD, JK ;

ROSS, RF .

APPLIED PHYSICS LETTERS, 1971, 18 (08) :344-&

[17] MORPHOLOGY OF VOID-HILLOCK FORMATION AT TRANSVERSE SCRATCHES IN ALUMINUM THIN FILM [J].

HOWARD, JK ;

ROSS, RF .

JOURNAL OF APPLIED PHYSICS, 1971, 42 (07) :2996-&

[18] MOTION OF LIQUID ALLOY ZONES ALONG BAR UNDER INFLUENCE OF ELECTRIC CURRENT [J].

HURLE, DTJ ;

PIKE, ER ;

MULLIN, JB .

PHILOSOPHICAL MAGAZINE, 1964, 9 (99) :423-&

[19] CONTRAST ASYMMETRIES IN LANG TOPOGRAPHS OF CRYSTALS STRAINED BY THIN FILMS [J].

MEIERAN, ES ;

BLECH, IA .

PHYSICA STATUS SOLIDI, 1968, 29 (02) :653-&

[20] VOID MARKER MOTION DURING ELECTROMIGRATION IN SN-IN THIN FILMS [J].

OHRING, M ;

SUN, PH .

THIN SOLID FILMS, 1971, 8 (06) :455-&

← 1 2 3 →