MODELING AND APPLICATION OF SYNCHRONIZATION OF NUCLEATION BY MEANS OF INTERMITTENT RADIANT HEATING

被引:4
作者
LARSSON, MI
HANSSON, GV
机构
[1] Department of Physics and Measurement Technology, Linköping University, Linköping
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 4B期
关键词
SYNCHRONIZATION OF NUCLEATION; RADIANT HEATING; MONTE-CARLO SIMULATION; SI(111); RHEED; MBE; SI HOMOEPITAXY; SIGE HETEROEPITAXY;
D O I
10.1143/JJAP.33.2282
中图分类号
O59 [应用物理学];
学科分类号
摘要
The method of synchronization of nucleation (SN) by means of periodically altering the substrate temperature has been studied theoretically by using a simple Monte Carlo simulation model and by applying a realistic temperature function. SN has also been studied experimentally using reflection high energy electron diffraction (RHEED) intensity oscillations. Results for SN applied to growth of Si and Si1-xGex on Si(111) are presented. Our growth simulations of Si on Si(111) support the experimental results that an improved layer-by-layer growth below the step flow regime can be obtained using SN.
引用
收藏
页码:2282 / 2289
页数:8
相关论文
共 13 条
[1]   ORIGIN OF REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION INTENSITY OSCILLATIONS DURING MOLECULAR-BEAM EPITAXY - A COMPUTATIONAL MODELING APPROACH [J].
CLARKE, S ;
VVEDENSKY, DD .
PHYSICAL REVIEW LETTERS, 1987, 58 (21) :2235-2238
[2]  
HULL R, 1991, SILICON MOL BEAM EPI, V220, P153
[3]   PERIODIC CHANGES IN THE STRUCTURE OF A SURFACE GROWING UNDER MBE CONDITIONS [J].
IRISAWA, T ;
ARIMA, Y ;
KURODA, T .
JOURNAL OF CRYSTAL GROWTH, 1990, 99 (1-4) :491-495
[4]   METHOD TO CALCULATE SUBSTRATE-TEMPERATURE DURING INTERMITTENT RADIANT HEATING IN VACUUM [J].
LARSSON, MI ;
HANSSON, GV .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (03) :732-735
[5]   SYNCHRONIZATION OF NUCLEATION STUDIED WITH MONTE-CARLO SIMULATIONS AND APPLIED TO SI1-XGEX MOLECULAR-BEAM EPITAXY [J].
LARSSON, MI ;
HANSSON, GV .
SURFACE SCIENCE, 1993, 292 (1-2) :98-113
[6]  
LARSSON MI, 1991, SILICON MOL BEAM EPI, V220, P49
[7]  
LARSSON MI, UNPUB
[8]  
LARSSON MI, 1993, J CRYST GROWTH, V194, P203
[9]   FAST MONTE-CARLO SIMULATION OF MBE GROWTH [J].
MAKSYM, PA .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1988, 3 (06) :594-596
[10]   MOLECULAR-BEAM EPITAXY WITH SYNCHRONIZATION OF NUCLEATION [J].
MARKOV, VA ;
PCHELYAKOV, OP ;
SOKOLOV, LV ;
STENIN, SI ;
STOYANOV, S .
SURFACE SCIENCE, 1991, 250 (1-3) :229-234