APPLICATIONS AND TRENDS IN PLASMA-ENHANCED ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION

被引：17

作者：

SUHR, H

机构：

[1] Department of Organic Chemistry, University of Tübingen, 7400 Tübingen

来源：

SURFACE & COATINGS TECHNOLOGY | 1991年 / 49卷 / 1-3期

关键词：

D O I：

10.1016/0257-8972(91)90061-Z

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The use of organometallic compounds in plasma-enhanced chemical vapour deposition is presented by a number of examples. The deposition technique, the choice of precursor and the nature of the resulting films are discussed.

引用

页码：233 / 238

页数：6

共 46 条

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