DEPOSITION OF THIN RHODIUM FILMS BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION

被引：19

作者：

ETSPULER, A

SUHR, H

机构：

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1989年 / 48卷 / 04期

关键词：

D O I：

10.1007/BF00618901

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：373 / 375

页数：3

共 16 条

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