PLASMA-SURFACE INTERACTIONS IN PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION

被引：18

作者：

HESS, DW

机构：

来源：

ANNUAL REVIEW OF MATERIALS SCIENCE | 1986年 / 16卷

关键词：

D O I：

10.1146/annurev.ms.16.080186.001115

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：163 / 183

页数：21

共 98 条

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