REPEATABILITY DEPENDENCE OF PHASE-CHANGE OPTICAL DISKS ON MORPHOLOGY OF PROTECTIVE LAYERS

被引:3
作者
CHIBA, R
YAMAZAKI, H
YAGI, S
FUJIMORI, S
机构
[1] NTT (Nippon Telegraph and Telephone Corporation), Applied Electronics Laboratories, Naka-Gun
关键词
D O I
10.1063/1.102919
中图分类号
O59 [应用物理学];
学科分类号
摘要
The surface or the Si3N4-sputtered protective layer of phase change optical recording media was observed with a scanning tunneling microscope. We found the morphology of the protective layer can be controlled by changing the sputtering gas conditions and that overwrite cycle repeatability strongly depends on it. As the Ar gas pressure in the sputtering chamber is decreased, the protective layers become denser and have a flatter surface, and the repeatability is improved from 3×103 to 5×10 5. The media sensitivity also depends on the morphology of the protective layers. The causes of media deterioration after a large number of overwrite cycles are discussed.
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页码:2373 / 2375
页数:3
相关论文
共 7 条
[1]   SURFACE STUDIES BY SCANNING TUNNELING MICROSCOPY [J].
BINNING, G ;
ROHRER, H ;
GERBER, C ;
WEIBEL, E .
PHYSICAL REVIEW LETTERS, 1982, 49 (01) :57-61
[2]   COMPOUND MATERIALS FOR REVERSIBLE, PHASE-CHANGE OPTICAL-DATA STORAGE [J].
CHEN, M ;
RUBIN, KA ;
BARTON, RW .
APPLIED PHYSICS LETTERS, 1986, 49 (09) :502-504
[3]   CRYSTALLIZATION PROCESS OF SB-TE ALLOY-FILMS FOR OPTICAL STORAGE [J].
FUJIMORI, S ;
YAGI, S ;
YAMAZAKI, H ;
FUNAKOSHI, N .
JOURNAL OF APPLIED PHYSICS, 1988, 64 (03) :1000-1004
[4]   MEASUREMENT OF STRAINS AT SI-SIO2 INTERFACE [J].
JACCODINE, RJ ;
SCHLEGEL, WA .
JOURNAL OF APPLIED PHYSICS, 1966, 37 (06) :2429-+
[5]   SCANNING TUNNELING MICROSCOPY AS A TOOL TO STUDY SURFACE-ROUGHNESS OF SPUTTERED THIN-FILMS [J].
SCHONENBERGER, C ;
ALVARADO, SF ;
ORTIZ, C .
JOURNAL OF APPLIED PHYSICS, 1989, 66 (09) :4258-4261
[6]   PROPERTIES OF MAGNETRON-SPUTTERED SILICON-NITRIDE FILMS [J].
SERIKAWA, T ;
OKAMOTO, A .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (12) :2928-2933
[7]   HIGH-SPEED OVERWRITABLE PHASE-CHANGE OPTICAL DISK MATERIAL [J].
YAMADA, N ;
OHNO, E ;
AKAHIRA, N ;
NISHIUCHI, K ;
NAGATA, K ;
TAKAO, M .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1987, 26 :61-66