AN ION-SPUTTERING GUN TO CLEAN CRYSTAL-SURFACES INSITU IN AN ULTRAHIGH-VACUUM ELECTRON-MICROSCOPE

被引：12

作者：

MORITA, E ^{[1
]}

TAKAYANAGI, K ^{[1
]}

KOBAYASHI, K ^{[1
]}

YAGI, K ^{[1
]}

HONJO, G ^{[1
]}

机构：

[1] TOKYO INST TECHNOL,DEPT PHYS,MEGURO KU,TOKYO 152,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1980年 / 19卷 / 10期

关键词：

D O I：

10.1143/JJAP.19.1981

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1981 / 1994

页数：14

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