INSITU ELECTRON-SPECTROSCOPY STUDY OF SI SURFACES AFTER AR-ION-ASSISTED CL2 ETCHING

被引：6

作者：

AOTO, N

IKAWA, E

KUROGI, Y

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 01期

关键词：

D O I：

10.1063/1.342562

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：158 / 163

页数：6

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