PROPERTIES OF RF-SPUTTERED AL2O3 FILMS DEPOSITED BY PLANAR MAGNETRON

被引：87

作者：

NOWICKI, RS ^{[1
]}

机构：

[1] HEWLETT PACKARD CO,CUPERTINO,CA 95014

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1977年 / 14卷 / 01期

关键词：

D O I：

10.1116/1.569103

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：127 / 133

页数：7

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