THERMOELECTRIC-POWER OF TELLURIUM-FILMS

被引：8

作者：

CHAUDHURI, S

CHAKRABARTI, B

PAL, AK

机构：

来源：

THIN SOLID FILMS | 1981年 / 82卷 / 03期

关键词：

D O I：

10.1016/0040-6090(81)90187-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：217 / 223

页数：7

共 16 条

[1]

Capers M. J., 1971, THIN SOLID FILMS, V8, P353

[2] ELECTRICAL PROPERTIES OF VACUUM-DEPOSITED TELLURIUM FILMS [J].

CAPERS, MJ ;

WHITE, M .

THIN SOLID FILMS, 1973, 15 (01) :5-14

[3] ELECTRICAL AND GALVANOMAGNETIC PROPERTIES OF TE FILMS [J].

CHAKRABARTI, B ;

PAL, AK .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (04) :591-596

[4] MICROSTRUCTURE OF TELLURIUM-FILMS [J].

CHAKRABARTI, B ;

CHAUDHURI, S ;

MALHOTRA, GL ;

PAL, AK .

JOURNAL OF APPLIED PHYSICS, 1980, 51 (08) :4111-4114

[5] THE DEPENDENCE OF THE TEXTURE OF TELLURIUM THIN-FILMS ON VACUUM DEPOSITION ANGLE [J].

COCKS, FH ;

PETERSON, MJ ;

JONES, PL .

THIN SOLID FILMS, 1980, 70 (02) :297-301

[6] INFLUENCE OF DEPOSITION RATE ON ELECTRICAL-PROPERTIES OF THIN TELLURIUM-FILMS [J].

DEVOS, A ;

AERTS, J .

THIN SOLID FILMS, 1977, 46 (02) :223-228

[7] STRUCTURAL DEPENDENCE OF ELECTRICAL-CONDUCTIVITY OF THIN TELLURIUM-FILMS [J].

DINNO, MA ;

SCHWARTZ, M ;

GIAMMARA, B .

JOURNAL OF APPLIED PHYSICS, 1974, 45 (08) :3328-3331

[8]

MOTT NF, 1971, ELECT PROCESSES NONC, P235

[9] EFFECT OF AU NUCLEATION CENTERS AND DEPOSITION RATE ON CRYSTALLINITY AND ELECTRONIC PROPERTIES OF EVAPORATED TE FILMS [J].

OKUYAMA, K ;

YAMAMOTO, H ;

KUMAGAI, Y .

JOURNAL OF APPLIED PHYSICS, 1975, 46 (01) :105-111

[10] MOBILITY STUDIES OF EVAPORATED TELLURIUM-FILMS [J].

OKUYAMA, K .

THIN SOLID FILMS, 1976, 33 (02) :165-171

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