PHOSPHORUS DIFFUSION IN PARTIALLY CRYSTALLIZED FILMS OF SIO2

被引：7

作者：

CAMPBELL, DR ^{[1
]}

ALESSAND.EI ^{[1
]}

TU, KN ^{[1
]}

LEWIS, JE ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1974年 / 121卷 / 08期

关键词：

D O I：

10.1149/1.2401981

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1081 / 1085

页数：5

共 30 条

[1] CATALYZED CRYSTALLIZATION IN SIO2 THIN-FILMS [J].

ALESSAND.EI ;

CAMPBELL, DR .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (08) :1115-1118

[2] EFFECT OF OXIDE LAYERS ON THE DIFFUSION OF PHOSPHORUS INTO SILICON [J].

ALLEN, RB ;

BERNSTEIN, H ;

KURTZ, AD .

JOURNAL OF APPLIED PHYSICS, 1960, 31 (02) :334-337

[3] DOPED OXIDES AS DIFFUSION SOURCES .2. PHOSPHORUS INTO SILICON [J].

BARRY, ML .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (11) :1405-&

[4] MOLECULAR TRANSPORT IN LIQUIDS AND GLASSES [J].

COHEN, MH ;

TURNBULL, D .

JOURNAL OF CHEMICAL PHYSICS, 1959, 31 (05) :1164-1169

[5]

CUKIERMAN J, 1973, J CHEM PHYS, V59, P3639

[6]

DOREMUS RH, 1969, PHYS CHEM GLASSES, V10, P28

[7] CALCULATION OF DIFFUSION PENETRATION CURVES FOR SURFACE AND GRAIN BOUNDARY DIFFUSION [J].

FISHER, JC .

JOURNAL OF APPLIED PHYSICS, 1951, 22 (01) :74-77

[8]

FRANZ I, 1971, SOLID STATE ELECTRON, V14, P835, DOI 10.1016/S0038-1101(71)80009-6

[9] AN ELECTRON MICROSCOPE STUDY OF DIFFUSION OF METALS IN AMORPHOUS ARSENIC TRISELENIDE FILMS [J].

FREEMAN, LA ;

SHAW, RF ;

YOFFE, AD .

THIN SOLID FILMS, 1969, 3 (05) :367-&

[10] SODIUM DIFFUSION IN SIO2 GLASS [J].

FRISCHAT, GH .

JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1968, 51 (09) :528-+

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