INSITU IR SPECTROSCOPIC STUDY OF A-SI-H FILMS GROWING UNDER PHOTO-CHEMICAL VAPOR-DEPOSITION CONDITION

被引：46

作者：

WADAYAMA, T ^{[1
]}

SUETAKA, W ^{[1
]}

SEKIGUCHI, A ^{[1
]}

机构：

[1] ANELVA CORP,TOKYO 183,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1988年 / 27卷 / 04期

关键词：

D O I：

10.1143/JJAP.27.501

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：501 / 505

页数：5

共 17 条

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