OBSERVATION OF ATOMIC DEFECTS ON LIF(100) SURFACE WITH ULTRAHIGH-VACUUM ATOMIC-FORCE MICROSCOPE (UHV AFM)

被引：44

作者：

OHTA, M

KONISHI, T

SUGAWARA, Y

MORITA, S

SUZUKI, M

ENOMOTO, Y

机构：

[1] NIPPON TELEGRAPH & TEL PUBL CORP, INTERDISCIPLINARY RES LABS, MUSASHINO 180, JAPAN

[2] MECH ENGN LAB, TSUKUBA 305, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1993年 / 32卷 / 6B期

关键词：

ATOMIC DEFECT; UHV AFM; ATOMIC FORCE MICROSCOPE; AFM; LIF; ATOMIC RESOLUTION; EDGE DISLOCATION;

D O I：

10.1143/JJAP.32.2980

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have constructed an atomic force microscope (AFM) operating under an ultrahigh vacuum (UHV). We have imaged the cleaved (100) surface of LiF ionic crystal to clarify the AFM's performance. As a result, for the first time, we have obtained atomically resolved AFM images of atomic defects penetrating the surface. This result seems to suggest that the cleaved LiF (100) surface was imaged under the condition of monoatomic or small cluster tip-sample interaction.

引用

页码：2980 / 2982

页数：3

共 15 条

[1] THEORETICAL INTERPRETATION OF ATOMIC-FORCE-MICROSCOPE IMAGES OF GRAPHITE [J].