FOCUSED ELECTRON AND ION-BEAM REPAIR STRATEGIES FOR WAFER-SCALE INTERCONNECTIONS IN THIN-FILM PACKAGING

被引:1
作者
LIN, HT
MCDONALD, JF
CORELLI, JC
BALAKRISHNAN, S
KING, N
机构
关键词
D O I
10.1016/0040-6090(88)90372-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:121 / 130
页数:10
相关论文
共 12 条
[1]  
BARTHA E, 1987, BLOOD CELLS, V12, P647
[2]  
DCRUZ C, 1985, J APPL PHYS, V58, P12424
[3]  
Economou N. P., 1987, Proceedings of the SPIE - The International Society for Optical Engineering, V773, P201, DOI 10.1117/12.940372
[4]  
EHRLICH DJ, 1981, APPL PHYS LETT, V39, P957, DOI 10.1063/1.92624
[5]   HIGH-CURRENT CU3P LIQUID-METAL ION-SOURCE USING A NOVEL EXTRACTOR CONFIGURATION [J].
HIGUCHIRUSLI, RH ;
CORELLI, JC .
APPLIED PHYSICS LETTERS, 1987, 51 (25) :2170-2172
[6]   MULTILEVEL INTERCONNECTIONS FOR WAFER SCALE INTEGRATION [J].
MCDONALD, JF ;
STECKL, AJ ;
NEUGEBAUER, CA ;
CARLSON, RO ;
BERGENDAHL, AS .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1986, 4 (06) :3127-3138
[7]   FOCUSED ION-BEAM INDUCED FINE PATTERNS OF ORGANOGOLD FILMS [J].
OHMURA, Y ;
SHIOKAWA, T ;
TOYODA, K ;
NAMBA, S .
APPLIED PHYSICS LETTERS, 1987, 51 (19) :1500-1502
[8]  
PAPADOPOULOS S, 1984, J PHYS-PARIS, V45, P9
[9]   A WAFER-SCALE DIGITAL INTEGRATOR USING RESTRUCTURABLE VSLI [J].
RAFFEL, JI ;
ANDERSON, AH ;
CHAPMAN, GH ;
KONKLE, KH ;
MATHUR, B ;
SOARES, AM ;
WYATT, PW .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1985, 32 (02) :479-486
[10]   MODELING OF INTEGRATED-CIRCUIT DEFECT SENSITIVITIES [J].
STAPPER, CH .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1983, 27 (06) :549-557