Mechanical properties of amorphous carbon nitride thin films prepared by reactive magnetron sputter-deposition

被引：24

作者：

Li, Dong ^{[1
]}

Chung, Yip-Wah ^{[1
]}

Wong, Ming-Show ^{[2
]}

Sproul, William D. ^{[2
]}

机构：

[1] Northwestern Univ, Robert R McCormick Sch Engn & Appl Sci, Dept Mat Sci & Engn, Evanston, IL 60208 USA

[2] Northwestern Univ, BIRL Ind Res Lab, Evanston, IL 60201 USA

来源：

TRIBOLOGY LETTERS | 1995年 / 1卷 / 01期

基金：

美国国家科学基金会;

关键词：

carbon nitride; sputter-deposition; stress; hardness;

D O I：

10.1007/BF00157978

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

Nanoindentation hardness and compressive stress in amorphous carbon nitride thin films prepared by unbalanced magnetron sputter-deposition were studied. The coating hardness and compressive stress were found to be strongly dependent on processing parameters such as substrate bias and nitrogen partial pressure. Under optimized deposition conditions, carbon nitride thin films with nanoindentation hardness about 25 GPa have been coated onto Si wafers and M2 steels. A strong correlation between coating hardness and compressive stress in the coating was observed.

引用

页码：87 / 93

页数：7

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