DIFFUSION OF GALLIUM THROUGH SILICON DIOXIDE FILMS INTO SILICON

被引：19

作者：

WAGNER, S

POVILONIS, EI

机构：

[1] BELL TEL LABS INC, HOLMDEL, NJ 07733 USA

[2] BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1974年 / 121卷 / 11期

关键词：

D O I：

10.1149/1.2401716

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1487 / 1496

页数：10

共 47 条

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