MEASUREMENT OF LOCAL LATTICE DISTORTION IN SILICON BY IMAGING-PLATE PLANE-WAVE X-RAY TOPOGRAPHY WITH IMAGE MAGNIFICATION

被引：2

作者：

KAWADO, S ^{[1
]}

KUDO, Y ^{[1
]}

KOJIMA, S ^{[1
]}

LIU, KY ^{[1
]}

ISHIKAWA, T ^{[1
]}

机构：

[1] UNIV TOKYO, FAC ENGN, BUNKYO KU, TOKYO 113, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1995年 / 34卷 / 1B期

关键词：

PLANE-WAVE X-RAY TOPOGRAPHY; IMAGE MAGNIFICATION; SYNCHROTRON RADIATION; IMAGING PLATE; LOCAL LATTICE DISTORTION;

D O I：

10.1143/JJAP.34.L89

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

One-dimensional image magnification was applied to imaging-plate plane-wave X-ray topography using synchrotron radiation, in order to improve the spatial resolution in measurements of variations in local lattice distortion in silicon. The distortion analysis was performed using the intensity change of a rocking curve obtained through a 5x magnifier crystal when the sample crystal was rotated around the Bragg angle. This article describes the result of measurements of lattice distortion due to striations in the growth direction in as-grown Czochralski silicon crystals.

引用

页码：L89 / L92

页数：4

共 21 条

[1] BOND WL, 1952, AM MINERAL, V37, P622
[2] X-RAY-MEASUREMENT OF MINUTE LATTICE STRAIN IN PERFECT SILICON-CRYSTALS
BONSE, U
HARTMANN, I
[J]. ZEITSCHRIFT FUR KRISTALLOGRAPHIE, 1981, 156 (3-4): : 265 - 279
[3] ELASTIC STRAIN AND COLORATION PATTERN IN NATURAL QUARTZ CRYSTALS
BONSE, U
[J]. ZEITSCHRIFT FUR PHYSIK, 1965, 184 (01): : 71 - &
[4] RONTGENOGRAPHISCHE ABBILDUNG DES VERZERRUNGSFELDES EINZELNER VERSETZUNGEN IN GERMANIUM-EINKRISTALLEN
BONSE, U
KAPPLER, E
[J]. ZEITSCHRIFT FUR NATURFORSCHUNG PART A-ASTROPHYSIK PHYSIK UND PHYSIKALISCHE CHEMIE, 1958, 13 (04): : 348 - &
[5] Bonse U., 1962, DIRECT OBSERVATION I, P431
[6] MULTIPLE CRYSTAL SYSTEM FOR HIGH STRAIN SENSITIVITY X-RAY TOPOGRAPHY AND ITS APPLICATIONS
HASHIZUME, H
IIDA, A
KOHRA, K
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1975, 14 (10) : 1433 - 1441
[7] QUANTITATIVE MEASURING METHOD OF GROWTH STRIATIONS IN CZOCHRALSKI-GROWN SILICON CRYSTAL
IMAI, M
SHIRAISHI, Y
SHIBATA, M
NODA, H
YATSURUGI, Y
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (07) : 1779 - 1783
[8] X-RAY TOPOGRAPHY WITH HIGHLY COLLIMATED BEAM AT PHOTON FACTORY
ISHIKAWA, T
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1989, 60 (07) : 2490 - 2493
[9] Kawado S., 1991, Diffusion and Defect Data - Solid State Data, Part B (Solid State Phenomena), V19-20, P429
[10] KAWADO S, 1990, DEFECT CONTROL SEMIC, P175

← 1 2 3 →