FLUORIDE ETCH MASKS FOR HIGH-RESOLUTION PATTERN TRANSFER

被引：20

作者：

SCHERER, A

VANDERGAAG, BP

BEEBE, ED

LIN, PSD

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1990年 / 8卷 / 01期

关键词：

D O I：

10.1116/1.584861

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：28 / 32

页数：5

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