OPTIMIZATION OF ARC EVAPORATED (TI,AL)N FILM COMPOSITION FOR CUTTING-TOOL APPLICATIONS

被引：37

作者：

COLL, BF

SATHRUM, P

FONTANA, R

PEYRE, JP

DUCHATEAU, D

BENMALEK, M

机构：

[1] CTR ETUD TECH IND MECAN,F-60304 SENLIS,FRANCE

[2] CRV SA,PECHINEY GRP,F-38340 VOREPPE,FRANCE

来源：

SURFACE & COATINGS TECHNOLOGY | 1992年 / 52卷 / 01期

关键词：

D O I：

10.1016/0257-8972(92)90371-G

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The arc evaporation process is commonly used to deposit TiN coatings for protection against wear and friction. The suitability of this established process for depositing ternary compound films of (TixAl1-x)N by using alloyed Ti-Al cathodes of various compositions is presented. The influence of the coating parameters on the final composition of the (Ti,Al)N films has been investigated. The bias voltage appears to be the main parameter controlling the final composition. Graded films with three different Al:Ti ratios (0.2, 0.3 and 0.8) have been prepared and comparative four-point-bending tests show a ductility of around 1.2%-1.5% for the (Ti,Al)N coatings. Comparative cutting tool experiments show the superior performance of (Ti,Al)N films for milling difficult-to-machine materials such as titanium alloys, stainless steels and nickel-based superalloys.

引用

页码：57 / 64

页数：8

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