SENSITIVITY OF X-RAY-DIFFRACTOMETRY FOR STRAIN DEPTH PROFILING IN III-V HETEROSTRUCTURES

被引：49

作者：

BENSOUSSAN, S

MALGRANGE, C

SAUVAGESIMKIN, M

机构：

[1] UNIV PARIS 07,CNRS,MINERAL & CRISTALLOG LAB,F-75252 PARIS 05,FRANCE

[2] UNIV PARIS 11,MEN,CEA,CNRS,UTILISAT RAYONNEMENT ELECTROMAGNET LAB,F-91405 ORSAY,FRANCE

来源：

JOURNAL OF APPLIED CRYSTALLOGRAPHY | 1987年 / 20卷

关键词：

D O I：

10.1107/S0021889887086801

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：222 / 229

页数：8

共 24 条

[1] X-RAY-DIFFRACTION EVIDENCE FOR TRANSIENT COMPOSITION EFFECTS IN MOVPE MULTILAYER GROWTH FOR GA1-XALXAS ALLOYS
BENSOUSSAN, S
MALGRANGE, C
SAUVAGESIMKIN, M
NGUESSAN, K
GIBART, P
[J]. JOURNAL OF APPLIED CRYSTALLOGRAPHY, 1987, 20 : 230 - 234
[2] APPLICATION OF DYNAMIC THEORY OF X DIFFRACTION IN STUDY OF BORON DIFFUSION AND OF PHOSPHORUS DIFFUSION IN SILICON CRYSTALS
BURGEAT, J
TAUPIN, D
[J]. ACTA CRYSTALLOGRAPHICA SECTION A-CRYSTAL PHYSICS DIFFRACTION THEORETICAL AND GENERAL CRYSTALLOGRAPHY, 1968, A 24 : 99 - &
[3] DOUBLE-CRYSTAL SPECTROMETER MEASUREMENTS OF LATTICE-PARAMETERS AND X-RAY TOPOGRAPHY ON HETEROJUNCTIONS GAAS-ALXGA1-XAS
ESTOP, E
IZRAEL, A
SAUVAGE, M
[J]. ACTA CRYSTALLOGRAPHICA SECTION A, 1976, 32 (JUL1): : 627 - &
[4] DETERMINATION OF STRAIN DISTRIBUTIONS FROM X-RAY BRAGG REFLECTION BY SILICON SINGLE-CRYSTALS
FUKUHARA, A
TAKANO, Y
[J]. ACTA CRYSTALLOGRAPHICA SECTION A, 1977, 33 (JAN1): : 137 - 142
[5] GIBART P, 1986, COMMUNICATION
[6] THE INTERPRETATION OF X-RAY ROCKING CURVES FROM III-V SEMICONDUCTOR-DEVICE STRUCTURES
HALLIWELL, MAG
LYONS, MH
HILL, MJ
[J]. JOURNAL OF CRYSTAL GROWTH, 1984, 68 (02) : 523 - 531
[7] COMBINED USE OF ION BACKSCATTERING AND X-RAY ROCKING CURVES IN THE ANALYSES OF SUPERLATTICES
HAMDI, AH
SPERIOSU, VS
TANDON, JL
NICOLET, MA
[J]. PHYSICAL REVIEW B, 1985, 31 (04): : 2343 - 2347
[8] SIMULATION OF X-RAY DOUBLE-CRYSTAL ROCKING CURVES OF MULTIPLE AND INHOMOGENEOUS HETEROEPITAXIAL LAYERS
HILL, MJ
TANNER, BK
HALLIWELL, MAG
LYONS, MH
[J]. JOURNAL OF APPLIED CRYSTALLOGRAPHY, 1985, 18 (DEC) : 446 - 451
[9] SYNCHROTRON X-RAY-DIFFRACTION STUDY OF SILICON DURING PULSED-LASER ANNEALING
LARSON, BC
WHITE, CW
NOGGLE, TS
MILLS, D
[J]. PHYSICAL REVIEW LETTERS, 1982, 48 (05) : 337 - 340
[10] STRAINS AND STRESSES AROUND IMPLANTATION BOUNDARIES IN BUBBLE MATERIALS - ELASTIC MODEL AND EXPERIMENTAL-DETERMINATION
MILTAT, J
[J]. IEEE TRANSACTIONS ON MAGNETICS, 1984, 20 (05) : 1114 - 1116

← 1 2 3 →