KINETICS OF THE THERMAL-OXIDATION OF SILICON .2. SOME THEORETICAL EVALUATIONS

被引：109

作者：

TILLER, WA

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 03期

关键词：

D O I：

10.1149/1.2129723

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

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页码：625 / 632

页数：8

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