PROPERTIES OF A HIGH-RESISTIVITY LAYER IN EPITAXIALLY GROWN GALLIUM-ARSENIDE FILM

被引:3
作者
OKAMOTO, H [1 ]
SAKATA, S [1 ]
机构
[1] NIPPON TEL & TEL PUBL CORP,MUSASHINO ELECT COMMUN LAB,MUSASHINO,TOKYO,JAPAN
关键词
D O I
10.1063/1.1654706
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:446 / 447
页数:2
相关论文
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