共 13 条
- [1] GROWTH OF SINGLE DOMAIN GAAS LAYER ON (100)-ORIENTED SI SUBSTRATE BY MOCVD [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1984, 23 (11): : L843 - L845
- [2] INITIAL-STAGES OF EPITAXIAL-GROWTH OF GAAS ON (100) SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1987, 61 (05) : 1856 - 1859
- [3] BIEGELSEN DK, 1987, IN PRESS MATER RES S, V102
- [5] ARSENIC-TERMINATED GE(111) - AN IDEAL 1 X 1 SURFACE [J]. PHYSICAL REVIEW LETTERS, 1985, 55 (05) : 533 - 536
- [6] CHAKRAVE.BK, 1967, J PHYS CHEM SOLIDS, V28, P2401, DOI 10.1016/0022-3697(67)90026-1
- [9] SELF-ANNIHILATION OF ANTIPHASE BOUNDARY IN GAAS ON SI(100) GROWN BY MOLECULAR-BEAM EPITAXY [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1987, 26 (06): : L944 - L946