SPECTROSCOPIC DIAGNOSTICS OF PLASMA-CHEMICAL-VAPOR DEPOSITION FROM SILANE AND GERMANE

被引：20

作者：

HATA, N

MATSUDA, A

TANAKA, K

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 61卷 / 08期

关键词：

D O I：

10.1063/1.337857

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3055 / 3060

页数：6

共 25 条

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