共 12 条
- [1] PROXIMITY EFFECT IN ELECTRON-BEAM LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1271 - 1275
- [2] CHUNG MSC, 1978, 8TH INT C EL ION BEA, P242
- [3] MODEL FOR EXPOSURE OF ELECTRON-SENSITIVE RESISTS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (06): : 1056 - 1059
- [6] GROBMAN WD, 1978, 8TH P INT C EL ION B, P265
- [7] JEWETT RE, 1976, 4TH TECHN C ELL
- [8] JONES F, 1978, 8TH P INT C EL ION B, P265
- [9] MONTE-CARLO SIMULATION OF SPATIALLY DISTRIBUTED BEAMS IN ELECTRON-BEAM LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1305 - 1308
- [10] NEUREUTHER A, 1978, 8TH P INT C EL ION B, P265