SOLID-PHASE LATERAL EPITAXIAL-GROWTH ONTO ADJACENT SIO2 FILM FROM AMORPHOUS-SILICON DEPOSITED ON SINGLE-CRYSTAL SILICON SUBSTRATE

被引：25

作者：

OHMURA, Y

MATSUSHITA, Y

KASHIWAGI, M

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1982年 / 21卷 / 03期

关键词：

D O I：

10.1143/JJAP.21.L152

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：L152 / L154

页数：3

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