CHARACTERIZATION OF SI LAYERS DEPOSITED ON (100) SI SUBSTRATES BY PLASMA CVD AND ITS APPLICATION TO SI HBTS

被引：8

作者：

KONDO, M

SAITOH, T

TAMURA, M

MATSUBARA, S

MIYAO, M

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1989年 / 28卷 / 09期

关键词：

D O I：

10.1143/JJAP.28.1531

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1531 / 1535

页数：5

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