HIGH-RATE DEPOSITION OF VC-TIC ALLOY CARBIDES BY ACTIVATED REACTIVE EVAPORATION

被引：7

作者：

NIMMAGADDA, R ^{[1
]}

BUNSHAH, RF ^{[1
]}

机构：

[1] UNIV CALIF LOS ANGELES,SCH ENGN & APPL SCI,LOS ANGELES,CA 90024

来源：

THIN SOLID FILMS | 1977年 / 45卷 / 03期

关键词：

D O I：

10.1016/0040-6090(77)90231-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：447 / 452

页数：6

共 9 条

[1] ACTIVATED REACTIVE EVAPORATION PROCESS FOR HIGH RATE DEPOSITION OF COMPOUNDS [J].

BUNSHAH, RF ;

RAGHURAM, AC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06) :1385-&

[2] MICROSTRUCTURE AND MECHANICAL BEHAVIOR OF CARBIDES [J].

HOLLOX, GE .

MATERIALS SCIENCE AND ENGINEERING, 1968, 3 (03) :121-&

[3]

HOLLOX GE, 1970, 2ND P INT C STRENGTH, V3, P1192

[4] OBTAINING MIXED CARBIDES FROM AUXILIARY METAL BATH [J].

JANGG, G ;

KIEFFER, R ;

USNER, L .

JOURNAL OF THE LESS-COMMON METALS, 1968, 14 (03) :269-&

[5]

MOVCHAN BA, 1969, FIZ MET METALLOVED, V28, P683

[6] PREPARATION OF ALLOY DEPOSITS BY CONTINUOUS ELECTRON-BEAM EVAPORATION FROM A SINGLE ROD-FED SOURCE [J].

NIMMAGADDA, R ;

BUNSHAH, RF ;

RAGHURAM, AC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06) :1406-+

[7]

NORTON JT, 1949, T AM I MIN MET ENG, V185, P133

[8] EFFECT OF SUBSTRATE TEMPERATURE ON STRUCTURE OF TITANIUM CARBIDE DEPOSITED BY ACTIVATED REACTIVE EVAPORATION [J].

RAGHURAM, AC ;

BUNSHAH, RF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06) :1389-&

[9] INFLUENCE OF SUBSTRATE TEMPERATURE AND DEPOSITION RATE ON STRUCTURE OF THICK SPUTTERED CU COATINGS [J].

THORNTON, JA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (04) :830-835

← 1 →