GERMANIUM SELENIDE - A RESIST FOR LOW-ENERGY ION-BEAM LITHOGRAPHY

被引：36

作者：

WAGNER, A

BARR, D

VENKATESAN, T

CRANE, WS

LAMBERTI, VE

TAI, KL

VADIMSKY, RG

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期

关键词：

D O I：

10.1116/1.571211

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1363 / 1367

页数：5

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