SILICON SELF-DIFFUSION IN THIN SIO2 AND PTSI FILMS

被引：23

作者：

PRETORIUS, R ^{[1
]}

BOTHA, AP ^{[1
]}

LOMBAARD, JC ^{[1
]}

机构：

[1] UNIV STELLENBOSCH,DEPT PHYS,DIV SOLID STATE,STELLENBOSCH 7600,SOUTH AFRICA

来源：

THIN SOLID FILMS | 1981年 / 79卷 / 01期

关键词：

D O I：

10.1016/0040-6090(81)90428-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：61 / 68

页数：8

共 22 条

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[8]

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