CONTOUR MODIFIERS FOR OPTICAL LITHOGRAPHY

被引:1
作者
WHITE, LK
机构
关键词
D O I
10.1149/1.2096145
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:1844 / 1846
页数:3
相关论文
共 10 条
[1]  
ARDEN W, 1985, P SOC PHOTO-OPT INST, V539, P219, DOI 10.1117/12.947836
[2]  
BOLSEN M, 1986, SOLID STATE TECHNOL, V29, P83
[3]  
BROWN AV, 1985, P SOC PHOTO-OPT INST, V539, P259, DOI 10.1117/12.947841
[4]  
CUTHBERT JD, 1977, SOLID STATE TECHNOL, V20, P59
[5]   LUBRICATION AND PATTERN IMPROVEMENT IN PHOTOLITHOGRAPHY [J].
FLOWERS, DL ;
SMITH, JN .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (07) :1579-1582
[6]   SENSITIVITY IMPROVEMENT OF X-RAY RESIST BY OVERLAYING OXYGEN BLOCKING FILM [J].
MOCHIJI, K ;
SODA, Y ;
KIMURA, T .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (01) :147-151
[7]   LINEWIDTH CONTROL IN PROJECTION LITHOGRAPHY USING A MULTILAYER RESIST PROCESS [J].
OTOOLE, MM ;
LIU, ED ;
CHANG, MS .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (11) :1405-1410
[8]   TOPOGRAPHY-INDUCED THICKNESS VARIATION ANOMALIES FOR SPIN-COATED, THIN-FILMS [J].
WHITE, LK ;
MISZKOWSKI, N .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (03) :862-868
[9]  
WHITE LK, 1985, P SPIE, V539, P33
[10]   LINEWIDTH VARIATIONS IN PHOTORESIST PATTERNS ON PROFILED SURFACES [J].
WIDMANN, DW ;
BINDER, H .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) :467-471