LINEWIDTH CONTROL IN PROJECTION LITHOGRAPHY USING A MULTILAYER RESIST PROCESS

被引：26

作者：

OTOOLE, MM

LIU, ED

CHANG, MS

机构：

来源：

关键词：

D O I：

10.1109/T-ED.1981.20622

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1405 / 1410

页数：6

共 14 条

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