INFLUENCE OF HEAT-TREATMENT ON ALUMINUM-OXIDE FILMS ON SILICON

被引：10

作者：

KAMOSHID.M

MAYER, JW

MITCHELL, IV

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1972年 / 43卷 / 04期

关键词：

D O I：

10.1063/1.1661386

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1717 / &

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MAYER, JW ;

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[8] INFLUENCE OF DEPOSITION TEMPERATURE ON PROPERTIES OF HYDROLYTICALLY GROWN ALUMINUM OXIDE FILMS [J].

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MITCHELL, IV ;

MAYER, JW .

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[9]

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[10] THE MECHANISMS FOR SILICON OXIDATION IN STEAM AND OXYGEN [J].

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