NEW APPROACH TO GROWTH OF HIGH-QUALITY GAAS-LAYERS ON SI SUBSTRATES

被引:22
作者
VARRIO, J [1 ]
ASONEN, H [1 ]
SALOKATVE, A [1 ]
PESSA, M [1 ]
RAUHALA, E [1 ]
KEINONEN, J [1 ]
机构
[1] HELSINKI UNIV,ACCELERATOR LAB,SF-00550 HELSINKI,FINLAND
关键词
D O I
10.1063/1.98527
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:1801 / 1803
页数:3
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