EFFECTS OF SPUTTERED PARTICLE ENERGY ON THE PROPERTIES OF SIO2-FILMS

被引：9

作者：

OHWAKI, T

TAGA, Y

机构：

来源：

APPLIED PHYSICS LETTERS | 1989年 / 55卷 / 09期

关键词：

D O I：

10.1063/1.101575

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：837 / 839

页数：3

共 22 条

[1] DEVELOPMENTS IN SECONDARY ION MASS-SPECTROSCOPY AND APPLICATIONS TO SURFACE STUDIES [J].

BENNINGHOVEN, A .

SURFACE SCIENCE, 1975, 53 (DEC) :596-625

[2]

KELLY R, 1987, NUCL INSTRUM METH B, V18, P398

[3] SECONDARY-ION MASS-SPECTROMETRY AND ITS USE IN DEPTH PROFILING [J].

LIEBL, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01) :385-391

[4] ION-BASED METHODS FOR OPTICAL THIN-FILM DEPOSITION [J].

MARTIN, PJ .

JOURNAL OF MATERIALS SCIENCE, 1986, 21 (01) :1-25

[5] A MODIFICATION TO THE FOWLER-NORDHEIM TUNNELING CURRENT CALCULATION FOR THIN MOS STRUCTURES [J].

OH, SJ ;

YEOW, YT .

SOLID-STATE ELECTRONICS, 1988, 31 (06) :1113-1118

[6] CHANGES IN COMPOSITION AND DEPOSITION RATES IN THE REACTIVE SPUTTERING OF COPPER, TITANIUM, AND YTTRIUM EXPOSED TO OXYGEN [J].

OHWAKI, T ;

TAGA, Y .

APPLIED PHYSICS LETTERS, 1989, 54 (17) :1664-1665

[7]

OHWAKI T, 1985, SURF SCI, V157, pL308, DOI 10.1016/0039-6028(85)90622-3

[8] SECONDARY ION EMISSION FROM SI SUBJECTED TO OXYGEN ION-BOMBARDMENT [J].

OHWAKI, T ;

TAGA, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1984, 23 (11) :1466-1469

[9] STUDY OF OXYGEN EFFECTS IN SECONDARY ION ENERGY-DISTRIBUTIONS [J].

OHWAKI, T ;

TAGA, Y .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1988, 33 (1-4) :523-525

[10]

ROTH J, 1983, TOP APPL PHYS, V52, P91

← 1 2 3 →