OHMIC CONTACTS OF AU AND AG TO P-GASB

被引:19
作者
MILNES, AG
YE, M
STAM, M
机构
[1] Electrical and Computer Engineering Department, Carnegie Mellon University, Pittsburgh
基金
美国国家科学基金会;
关键词
D O I
10.1016/0038-1101(94)90101-5
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Evaporated contacts of Au, Au(Zn), Au(In, Zn) Au(Ge), Ag, Ag(Zn), Ag(Ge), Ag(Sn), Ag(In), In, In(Zn), ln(Ge), and Al have been studied for p-GaSb(100) doped in the range 8 x 10(16)-1 x 10(19) cm-3. Annealing was typically at a temperature 250-350-degrees-C for 10-30 min. A transmission line and other methods were used to determine the specific contact resistivity. For material of a carrier doping density 10(18) cm-3 the contacts exhibited values about 5 x 10(-5) OMEGA cm2. For other dopings the contact resistivity tended to be inversely proportional to the doping density, and at 1 x 10(19) cm-3 the value was 5 x 10(-6) OMEGA cm2. Ag contacts were stable in resistance for at least 100 h at 350-degrees-C and therefore may be expected to have little change over many thousands of hours at 70-degrees-C. The Au based contacts however began to increase in resistance after 30 h at 250-degrees-C. Models for the calculation of specific contact resistivity have been applied to p-GaSb and comparison with experimental results made.
引用
收藏
页码:37 / 44
页数:8
相关论文
共 31 条
[1]  
BOER KW, 1990, SURVEY SEMICONDUCTOR, P959
[2]   ALLOYED OHMIC CONTACTS TO GAAS [J].
BRASLAU, N .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (03) :803-807
[3]   DETERMINING SPECIFIC CONTACT RESISTIVITY FROM CONTACT END RESISTANCE MEASUREMENTS [J].
CHERN, JGJ ;
OLDHAM, WG .
IEEE ELECTRON DEVICE LETTERS, 1984, 5 (05) :178-180
[4]   ELECTRON TUNNELING IN METAL-SEMICONDUCTOR BARRIERS [J].
CONLEY, JW ;
DUKE, CB ;
MAHAN, GD ;
TIEMANN, JJ .
PHYSICAL REVIEW, 1966, 150 (02) :466-&
[5]   EXPERIMENTAL ASPECTS OF TUNNELING IN METAL-SEMICONDUCTOR BARRIERS [J].
CONLEY, JW ;
TIEMANN, JJ .
JOURNAL OF APPLIED PHYSICS, 1967, 38 (07) :2880-&
[6]   OHMIC CONTACTS FOR GAAS DEVICES [J].
COX, RH ;
STRACK, H .
SOLID-STATE ELECTRONICS, 1967, 10 (12) :1213-+
[7]   SPREADING OF AU DOTS ON INP SURFACES [J].
ELIAS, KR ;
MAHAJAN, S ;
BAUER, CL ;
MILNES, AG ;
BONNER, WA .
JOURNAL OF APPLIED PHYSICS, 1987, 62 (04) :1245-1250
[8]   INFLUENCE OF GALLIUM IN A METALLIZATION ON GAAS [J].
GUPTA, RP ;
WUERFL, J ;
HARTNAGEL, HL ;
KHOKLE, WS .
IEE PROCEEDINGS-I COMMUNICATIONS SPEECH AND VISION, 1988, 135 (02) :25-28
[9]   AN IMPROVED MODEL TO EXPLAIN OHMIC CONTACT RESISTANCE OF N-GAAS AND OTHER SEMICONDUCTORS - COMMENTS [J].
GUPTA, RP ;
KHOKLE, WS .
SOLID-STATE ELECTRONICS, 1987, 30 (06) :672-672
[10]  
HEINZ CH, 1983, INT J ELECTRON, V54, P254