LOW-PRESSURE MOVPE GROWTH OF ZNSE, ZNTE, AND ZNSE/ZNTE STRAINED-LAYER SUPERLATTICES

ZnSe and ZnTe single-crystal layers have been grown onto {100} GaAs substrates by low- pressure metalorganic vapor-phase epitaxy (LP-MOVPE) using the triethylamine-dimethylzinc adduct [DMZn(NEt3)] as the zinc precursor. The selenium and tellurium precursors were H2Se (5% in H-2) and di-isopropyltellurium (DiPTe), respectively. These two semiconductors have been grown with different VI/II molar ratios, at different growth temperatures, and with an overall growth pressure ranging from 40 to 400 Torr. Optimal growth parameters have been determined by optical means for the two materials. This information was then used to grow ZnTe/ZnSe strained-layer superlattices. We have studied structures grown on both ZnSe and ZnTe relaxed buffer layers which display a drastic dependence of the Stokes shift between photoluminescence and the optical bandgap on the nature of the buffer layer. Growth interruptions have been used to optimize the optical properties of the superlattices. Theoretical modeling of superlattice band structures has been performed using results of optical and structural characterizations. Observations of zone center transitions as well as excitons associated with the miniband dispersion of the superlattices are reported, in agreement with the theoretical calculation.