FABRICATION OF POLYIMIDE MASKS FOR X-RAY-LITHOGRAPHY

被引：7

作者：

GONG, BM

YE, YD

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期

关键词：

D O I：

10.1116/1.571244

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1204 / 1207

页数：4

共 8 条

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[2] FLANDERS DC, 1977, 14TH P S EL ION PHOT
[3] HAYASHI T, 1978, 8TH P S EL ION BEAM, P85
[4] BORON-NITRIDE MASK STRUCTURE FOR X-RAY-LITHOGRAPHY
MAYDAN, D
COQUIN, GA
LEVINSTEIN, HJ
SINHA, AK
WANG, DNK
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1959 - 1961
[5] HIGH-SPEED REPLICATION OF SUBMICRON FEATURES ON LARGE AREAS BY X-RAY LITHOGRAPHY
MAYDAN, D
COQUIN, GA
MALDONADO, JR
SOMEKH, S
LOU, DY
TAYLOR, GN
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 429 - 433
[6] PREPARATION OF X-RAY-LITHOGRAPHY MASKS WITH 0.1 MU-M STRUCTURES
PARRENS, P
TABOURET, E
TACUSSEL, MC
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1965 - 1967
[7] SEARS RL, 1972, SOLID STATE TECHNOL, P21
[8] YAMAGISHI F, 1980, 9TH P INT C EL ION B, P445