PHYSICOCHEMICAL PROPERTIES OF PHOTO-CVD SILICON-NITRIDE THIN-FILMS

被引：10

作者：

BERTI, M

MELIGA, M

ROVAI, G

STANO, S

TAMAGNO, S

机构：

[1] CTR STUDI & LAB TELECOMUN,I-10148 TORINO,ITALY

[2] CISM,PADOVA,ITALY

来源：

THIN SOLID FILMS | 1988年 / 165卷 / 01期

关键词：

D O I：

10.1016/0040-6090(88)90699-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：279 / 290

页数：12

共 16 条

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