PREFERRED SPUTTERING ON BINARY ALLOY SURFACES OF THE AL-PD-SI SYSTEM

被引：18

作者：

LEWIS, JE

HO, PS

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 02期

关键词：

D O I：

10.1116/1.570082

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：772 / 773

页数：2

共 10 条

[1]

Andersen N., 1974, DAN VIDENSK SELSK MA, V39

[2] SURFACE ENRICHMENT OF COPPER DUE TO KEV XE SPUTTERING OF AN AL-CU MIXTURE [J].

CHU, WK ;

HOWARD, JK ;

LEVER, RF .

JOURNAL OF APPLIED PHYSICS, 1976, 47 (10) :4500-4503

[3] EFFECTS OF ENHANCED DIFFUSION ON PREFERRED SPUTTERING OF HOMOGENEOUS ALLOY SURFACES [J].

HO, PS .

SURFACE SCIENCE, 1978, 72 (02) :253-263

[4] AUGER STUDY OF PREFERRED SPUTTERING ON BINARY ALLOY SURFACES [J].

HO, PS ;

LEWIS, JE ;

WILDMAN, HS ;

HOWARD, JK .

SURFACE SCIENCE, 1976, 57 (01) :393-405

[5]

HO PT, UNPUBLISHED

[6]

Hwang Joonsik, COMMUNICATION

[7] INFLUENCE OF ATOMIC MIXING AND PREFERENTIAL SPUTTERING ON DEPTH PROFILES AND INTERFACES [J].

LIAU, ZL ;

TSAUR, BY ;

MAYER, JW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02) :121-127

[8]

PICKERING HW, 1976, J VACUUM SCI TECHNOL, V13, P611

[9]

Wehner G.K., 1975, METHODS SURFACE ANAL

[10] INFLUENCE OF ALTERED LAYER ON DEPTH PROFILING MEASUREMENTS [J].

WINTERS, HF ;

COBURN, JW .

APPLIED PHYSICS LETTERS, 1976, 28 (04) :176-179

← 1 →