DEVELOPED PROFILE OF HOLOGRAPHICALLY EXPOSED PHOTORESIST GRATINGS

被引：51

作者：

MELLO, BD ^{[1
]}

DACOSTA, IF ^{[1
]}

LIMA, CRA ^{[1
]}

CESCATO, L ^{[1
]}

机构：

[1] UNIV METODISTA PIRACICABA, CTR TECNOL, DEPT FIS, SANTA BARBARA DOESTE, SP, BRAZIL

来源：

APPLIED OPTICS | 1995年 / 34卷 / 04期

关键词：

HOLOGRAPHIC GRATINGS; PHOTORESIST PROCESSING;

D O I：

10.1364/AO.34.000597

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A simulation of the profile of holographically recorded structures in photoresists is performed. In addition to its simplicity this simulation can he used to take into account the effects that arise from exposure, photosensitization, development, and resolution of positive photoresists. We analyzed the effects of isotropy of wet development, nonlinearity of the photoresist response curve, background light, and standing waves produced by reflection at the film-substrate interface by using this simulation, and the results agree with the experimentally recorded profiles.

引用

页码：597 / 603

页数：7

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