OXIDATION INTERFERENCE IN DIRECT LASER NITRIDATION OF TITANIUM - RELATIVE MERITS OF VARIOUS AMBIENT GASES

被引：28

作者：

DANNA, E

DEGIORGI, ML

LEGGIERI, G

LUCHES, A

MARTINO, M

PERRONE, A

MIHAILESCU, IN

MENGUCCI, P

DRIGO, AV

机构：

[1] UNITA INFM, LECCE, ITALY

[2] INST ATOM PHYS, BUCHAREST, ROMANIA

[3] UNIV ANCONA, DEPT MAT & EARTH SCI, I-60100 ANCONA, ITALY

[4] UNITA INFM, ANCONA, ITALY

[5] UNITA INFM, PADUA, ITALY

[6] UNIV PADUA, DEPT PHYS, I-35100 PADUA, ITALY

来源：

THIN SOLID FILMS | 1992年 / 213卷 / 02期

关键词：

D O I：

10.1016/0040-6090(92)90283-H

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A comparison is performed between the relative merits of using an ambient NH3 atmosphere or a stoichiometrically equivalent N2-H-2 (1:3) mixture for the direct laser nitridation of titanium samples by multipulse excimer laser (lambda = 308 nm) irradiation. It is shown that the N2-H-2 mixture proves more efficient in inhibiting the unwanted interference of the oxidation process and that the whole process proceeds through the action of an erosion plasma on a molten layer covering the laser-irradiated area.

引用

页码：197 / 204

页数：8

共 17 条

[1] ANALYTICAL ELECTRON-MICROSCOPY OF AL/TIN CONTACTS ON SILICON FOR APPLICATIONS TO VERY LARGE-SCALE INTEGRATED DEVICES [J].