ASPECTS OF QUANTITATIVE SECONDARY ION MASS-SPECTROMETRY

被引:93
作者
WITTMAACK, K
机构
来源
NUCLEAR INSTRUMENTS & METHODS | 1980年 / 168卷 / 1-3期
关键词
D O I
10.1016/0029-554X(80)91275-6
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:343 / 356
页数:14
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共 70 条
[31]  
Jurela Z., 1973, International Journal of Mass Spectrometry and Ion Physics, V12, P33, DOI 10.1016/0020-7381(73)80084-1
[32]  
Jurela Z., 1972, Radiation Effects, V13, P167, DOI 10.1080/00337577208231176
[33]   SECONDARY ION QUADRUPOLE MASS-SPECTROMETER FOR DEPTH PROFILING-DESIGN AND PERFORMANCE EVALUATION [J].
MAGEE, CW ;
HARRINGTON, WL ;
HONIG, RE .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1978, 49 (04) :477-485
[34]   DEEXCITATION PROCESSES NEAR-SURFACE OF ION BOMBARDED SIO2 AND SI [J].
MARTIN, PJ ;
BAYLY, AR ;
MACDONALD, RJ ;
TOLK, NH ;
CLARK, GJ ;
KELLY, JC .
SURFACE SCIENCE, 1976, 60 (02) :349-364
[35]   SECONDARY ION EMISSION FROM SILICON AND SILICON-OXIDE [J].
MAUL, J ;
WITTMAACK, K .
SURFACE SCIENCE, 1975, 47 (01) :358-369
[36]   DETERMINATION OF IMPLANTATION PROFILES IN SOLIDS BY SECONDARY ION MASS-SPECTROMETRY [J].
MAUL, J ;
WITTMAACK, K ;
SCHULZ, F .
PHYSICS LETTERS A, 1972, A 41 (02) :177-+
[37]  
MAUL J, 1974, THESIS TU MUNCHEN
[38]  
MCHUGH JA, 1975, METHODS SURFACE ANAL, V1, P223
[39]   MOLECULAR VERSUS ATOMIC SECONDARY ION EMISSION FROM SOLIDS [J].
MORGAN, AE ;
WERNER, HW .
JOURNAL OF CHEMICAL PHYSICS, 1978, 68 (08) :3900-3909
[40]   QUANTITATIVE SIMS STUDIES WITH A URANIUM MATRIX [J].
MORGAN, AE ;
WERNER, HW .
SURFACE SCIENCE, 1977, 65 (02) :687-699