PREPARATION OF HARD COATINGS BY ION-BEAM METHODS

被引:108
作者
WEISSMANTEL, C
REISSE, G
ERLER, HJ
HENNY, F
BEWILOGUA, K
EBERSBACH, U
SCHURER, C
机构
[1] Sektion Physik/Elektronische Bauelemente, Technische Hochschule, 9010 Karl-Marx-Stadt
关键词
D O I
10.1016/0040-6090(79)90035-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The activated growth of surface coatings under the influence of impinging ionized species has been investigated by beam techniques operating in high vacuum. A brief survey of the operating parameters using one or several beam bundles of ions or neutrals is given. Some results and problems are discussed in connection with the following processes: (1) nitriding of iron by low energy ion bombardment; (2) dual beam synthesis of silicon nitride and of hard carbon; (3) preparation of chromium-carbon and of hard carbon layers by ion beam plating from organic vapours. It is concluded that beam techniques can contribute to a better understanding of activated film growth at high rates of deposition. Moreover, ion beam methods offer interesting prospects for the preparation of special layer structures, particularly unusual film phases such as the hard i-carbon. © 1979.
引用
收藏
页码:315 / 325
页数:11
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