OXIDATION INHIBITING PROPERTIES OF SI3N4-LAYERS PRODUCED BY ION-IMPLANTATION

被引：23

作者：

RAMIN, M

RYSSEL, H

KRANZ, H

机构：

来源：

APPLIED PHYSICS | 1980年 / 22卷 / 04期

关键词：

D O I：

10.1007/BF00901063

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：393 / 397

页数：5

共 13 条

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[9]

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