PROPERTIES OF ANODIC OXIDE LAYERS FORMED ON NITROGEN-CONTAINING TANTALUM FILMS

被引：19

作者：

SIMMONS, RT

MORZENTI, PT

SMYTH, DM

GERSTENBERG, D

机构：

[1] WESTERN ELECT CO INC, WINSTON SALEM, NC 27102 USA

[2] WESTERN ELECT CO INC, N ANDOVER, MS 01845 USA

[3] LEHIGH UNIV, MAT RES CTR, BETHLEHEM, PA 18015 USA

[4] BELL TEL LABS INC, ALLENTOWN, PA 18103 USA

来源：

THIN SOLID FILMS | 1974年 / 23卷 / 01期

关键词：

D O I：

10.1016/0040-6090(74)90218-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：75 / 87

页数：13

共 23 条

[1] IN-SITU REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION STUDY OF NUCLEATION AND GROWTH OF TANTALUM FILMS [J].

AXELROD, NN ;

MARCUS, RB .

THIN SOLID FILMS, 1973, 15 (02) :S21-S23

[2] STATUS OF THIN-FILM INTEGRATED-CIRCUIT TECHNOLOGY [J].

BASSECHES, H ;

GERSTENBERG, D .

THIN SOLID FILMS, 1972, 12 (02) :295-+

[3] USE OF RUTHERFORD BACKSCATTERING TO STUDY BEHAVIOR OF ION-IMPLANTED ATOMS DURING ANODIC-OXIDATION OF ALUMINUM - AR, KR, XE, K, RB, CS, CL, BR, AND I [J].

BROWN, F ;

MACKINTOSH, WD .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (08) :1096-1102

[4]

BROWN R, 1969, PHYSICAL MEASUREMENT

[5]

DELLOCA CJ, 1970, J ELECTROCHEM SOC, V117, P1545, DOI [10.1149/1.2407379, 10.1149/1.2407380]

[6] FACTORS CONTROLLING STRUCTURE OF SPUTTERED TA FILMS [J].

FEINSTEIN, LG ;

HUTTEMANN, RD .

THIN SOLID FILMS, 1973, 16 (02) :129-145

[7] PROPERTIES OF ANODIC FILMS FORMED ON REACTIVELY SPUTTERED TANTALUM [J].

GERSTENBERG, D .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (06) :542-+

[8] INVESTIGATIONS ON TA2N OXIDE-FILMS [J].

JUERGENS, W .

THIN SOLID FILMS, 1973, 16 (03) :359-367

[9] IONIC CONDUCTIVITY DIELECTRIC CONSTANT AND OPTICAL PROPERTIES OF ANODIC OXIDE FILMS ON 2 TYPES OF SPUTTERED TANTALUM FILMS [J].

MILLS, D ;

YOUNG, L ;

ZOBEL, FGR .

JOURNAL OF APPLIED PHYSICS, 1966, 37 (04) :1821-&

[10] QUANTITATIVE-ANALYSIS OF LIGHT ELEMENTS (NITROGEN, CARBON, AND OXYGEN) IN SPUTTERED TANTALUM FILMS BY AUGER-ELECTRON SPECTROSCOPY AND SECONDARY ION MASS-SPECTROMETRY (SIMS) [J].

MORABITO, JM .

ANALYTICAL CHEMISTRY, 1974, 46 (02) :189-196

← 1 2 3 →