WORKING GAS-PRESSURE AND FLOW EFFECTS ON REACTIVELY SPUTTERED MOLYBDENUM OXIDE THIN-FILMS

被引：8

作者：

JANKOWSKI, AF

SCHRAWYER, LR

机构：

来源：

SURFACE & COATINGS TECHNOLOGY | 1992年 / 54卷 / 1-3期

关键词：

D O I：

10.1016/0257-8972(92)90187-F

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The microstructure and composition of reactively sputtered, molybdenum oxide thin films are found to be especially sensitive to the working gas pressure and flow conditions. The variations in composition and crystallographic texture of nominal Mo2O3 films are studied, as formed at low pressure (less than 5 mTorr) and flow (less than 25 cm3 min-1) conditions, using Auger electron spectroscopy and X-ray diffraction. The structure and composition of the Mo2O3 films are categorized as part of a continuous series of molybdenum oxide compounds based on a body centered tetragonal unit cell.

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页码：349 / 354

页数：6

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