PRINTABILITY OF SUB-150 NM FEATURES IN X-RAY-LITHOGRAPHY - THEORY AND EXPERIMENTS

被引：14

作者：

HECTOR, SD

WONG, VV

SMITH, HI

MCCORD, MA

RHEE, KW

机构：

[1] IBM CORP,CTR SEMICOND RES & DEV,YORKTOWN HTS,NY 10598

[2] USN,RES LAB,NANOELECTR PROC FACIL,WASHINGTON,DC 20375

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.587411

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：3965 / 3969

页数：5

共 17 条

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